EUV mirrors needed bumps no thicker than 2.3 silicon atoms, versus roughly 4,000 silicon atoms on a household mirror.
EUV mirrors needed bumps no thicker than 2.3 silicon atoms, versus roughly 4,000 silicon atoms on a household mirror.
More from this video
See all →Scaled to Earth’s size, the largest bump on the lithography machine’s mirrors would be no thicker…
Scaled to the world, a high-NA mirror’s tallest bump would be playing-card thick. A low-NA…
ASML’s high-NA EUV machine costs north of 350 million euros. One machine costs more than many…
EUV manufacturing coordinates 5,000 suppliers, 100,000 parts, 3,000 cables, 40,000 bolts, and two…
A single nanometer of tin debris on the collector mirror can take the mirror out of commission.
The only machine enabling the next stage of chip miniaturization costs about $400 million.
The Engineering Test Stand fired a 1,700-watt laser into xenon gas to produce 13.4-nanometer light.
High-NA projection optics shrink a chip pattern eight times vertically and four times horizontally.
Don't lose this one
A free account saves insights like this to your Boards, and Korva resurfaces them so you actually remember.
