By 1993, x-ray lithography had an international conference in Japan and a new name: extreme ultraviolet lithography, or EUV.
By 1993, x-ray lithography had an international conference in Japan and a new name: extreme ultraviolet lithography, or EUV.
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A single nanometer of tin debris on the collector mirror can take the mirror out of commission.
The only machine enabling the next stage of chip miniaturization costs about $400 million.
The Engineering Test Stand fired a 1,700-watt laser into xenon gas to produce 13.4-nanometer light.
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